在线拍卖一条完整的8寸PLC平面光波导晶圆生产线,来自朗美通Lumentum
主要设备:
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• Applied Materials应用材料 5200 Centura Dry Etch Cluster Tool, (3) Process Chambers + Clean
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• Applied Materials应用材料 5200 Centura Dry Oxide Etch Cluster Tool, Dual Process Chambers
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• Applied Materials应用材料 HP Centura PVD Cluster Tool, Dual Process Chambers + Cooling & Clean
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• Novellus Concept Two Sequel CVD Cluster Tool, Dual Oxide Deposition Process Chambers
了解详情